Titanium complexes, their production methods, titanium-containing thin films, and their formation methods
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Dec 15, 2009
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Nov 1, 2006
filing date -
Nov 11, 2005
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Abstract
Objects of the present invention are to provide a novel titanium complex that has good vaporization characteristics and an excellent thermal stability, and becomes a raw material for forming a titanium-containing thin film by methods such as CVD method or ALD method, its production method, a titanium-containing thin film formed using the same, and its formation method. In the invention, a titanium complex represented by the general formula (1) is produced by reacting a diimine represented by the general formula (2) and metallic lithium, and then reacting a tetrakisamide complex represented by the general formula (3).each independently represents an alkyl group having from 1 to 4 carbon atoms.).
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