Plasma source and plasma processing apparatus
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United States of America Patent
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Dec 15, 2009
Grant Date -
Jan 25, 2007
app pub date -
May 28, 2004
filing date -
May 30, 2003
priority date (Note) -
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Abstract
A plasma source (1) is composed of a chamber (2) to which a gas should be supplied and a hollow cathode electrode member (4) which is arranged on the gas flow-out side of the chamber (2) and has a plurality of electrode holes (3) through which the gas can flow. In such a plasma source (1), microcathode plasma discharge can be performed in the electrode holes (3) of the hollow cathode electrode member (4).
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