Light source device for producing extreme ultraviolet radiation and method of generating extreme ultraviolet radiation
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Dec 1, 2009
Grant Date -
Feb 28, 2008
app pub date -
Jul 30, 2007
filing date -
Jul 28, 2006
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
Electrode ablation is controlled in EUV light source device that gasifies a raw material by irradiation with an energy beam and produces a high-temperature plasma using electrodes a raw material for plasma is dripped in a space in the vicinity of, but other than, the discharge region and from which the gasified raw material can reach the discharge region between the discharge electrodes and a laser beam irradiates the high-temperature plasma raw material. A gasified high-temperature plasma raw material, gasified by the laser beam, spreads in the direction of the discharge region. At this time, power is applied on a pair of discharge electrodes, the gasified high-temperature plasma raw material is heated and excited to become a high-temperature plasma, and EUV radiation is emitted. This EUV radiation is collected by an EUV collector mirror and sent to lithography equipment.
First Claim
Other Claims data not available
Family
International Classification(s)
- 2007 Application Filing Year
- H05H Class
- 232 Applications Filed
- 92 Patents Issued To-Date
- 39.66 % Issued To-Date
