Imprinting polymer film on patterned substrate
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United States of America Patent
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Nov 17, 2009
Grant Date -
Mar 15, 2007
app pub date -
May 20, 2004
filing date -
May 23, 2003
priority date (Note) -
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Abstract
A method of applying a pattern on a topography includes first applying a polymer film to an elastomer member, such as PDMS, to form a pad. The pad is then applied to a substrate having a varying topography under pressure. The polymer film is transferred to the substrate due to the plastic deformation of the polymer film under pressure compared to the elastic deformation of the PDMS member. Thus, upon removal of the pad from the substrate, the PDMS member pulls away from the polymer layer, thereby depositing the polymer layer upon the substrate.
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