Photomask to which phase shift is applied and exposure apparatus
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United States of America Patent
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Oct 27, 2009
Grant Date -
Sep 21, 2006
app pub date -
Mar 10, 2006
filing date -
Mar 18, 2005
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A problem of a decrease in transmissive light, which partly occurs at a boundary between two polarization modulation regions of a polarized phase shift mask, is solved. A photomask for use in an exposure apparatus which forms an exposure pattern by illumination includes at least two polarization modulation regions which produce mutually incoherent polarized light components and adjoin each other, at least two phase modulation regions which impart a phase difference of 180° and adjoin each other, and amplitude modulation regions which decrease transmittance. A contact line between the polarization modulation regions and a contact line between the phase modulation regions are located at a corresponding position, and the amplitude modulation regions are provided on both sides of the common contact line, with a predetermined distance from the common contact line.
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