Photosensitive resin, photosensitive composition and photo-crosslinked structure
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United States of America Patent
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Oct 20, 2009
Grant Date -
Oct 19, 2006
app pub date -
Mar 31, 2006
filing date -
Mar 31, 2005
priority date (Note) -
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Abstract
The invention provides a photosensitive resin which can readily form, through photo-crosslinking, a surface coating which has hydrophilicity and high bioadaptability; a photosensitive composition containing the photosensitive resin; and a photo-crosslinked structure obtained from the photosensitive composition.The photosensitive resin is represented by the following formula (1):, which may be identical to or different from each other, each represent an alkylene group, an arylene group, an oxyalkylene group, or a single bond; each of X and Y represents a photosensitive unit represented by the following formula (2):represents a group selected from among the groups represented by the following formula set (3):represents a group selected from among the groups represented by the following formula set (4):represents a hydrogen atom, an alkyl group, an acetal-group-containing alkyl group, an aryl group, an aralkyl group, or a substituent containing a base-forming nitrogen atom).
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