Controlled zone microwave plasma system
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United States of America Patent
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Oct 20, 2009
Grant Date -
Nov 8, 2007
app pub date -
May 2, 2006
filing date -
May 2, 2006
priority date (Note) -
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Abstract
An apparatus and method for initiating a process gas plasma. A conductive plate having a plurality of conductive fingers is positioned in a microwave applicator. An arc forms between the conductive fingers to initiate the formation of a plasma. A transport mechanism may convey process materials through the plasma. A spray port may be provided to expel processed materials.
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