Method of fabricating waveguide using sacrificial spacer layer
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United States of America Patent
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Oct 6, 2009
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N/A
app pub date -
Jun 7, 2006
filing date -
Jun 7, 2006
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Expired
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Abstract
The present invention is a method of fabricating a waveguide using a sacrificial spacer layer. The first step in this process is to fabricate the underlying optical semiconductor structure. A trench is then etched in this structure and a sacrificial spacer layer is deposited in the trench. The waveguide is then created in the trench on the sacrificial spacer layer. User-defined portions of the sacrificial spacer layer are subsequently removed to create air gaps between the waveguide and the sidewalls of the trench in the optical semiconductor.
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