Photocatalytic material

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United States of America Patent

PATENT NO 7585903
APP PUB NO 20060177671A1
SERIAL NO

10547551

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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A photocatalytic material which comprises a resin base and photocatalyst particles tenaciously deposited thereon in such a manner that the function of the photocatalyst is not impaired. Even when the photocatalytic material is used over long, the photocatalyst particles are less apt to shed and the resin base is less apt to deteriorate. In the photocatalytic material, the photocatalyst particles have been bonded to the base by chemical bonding through a silane compound. The photocatalytic material is characterized in that the chemical bonding through a silane compound is bonding by graft polymerization, and that the graft polymerization is radiation-induced graft polymerization.

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Patent Owner(s)

Patent OwnerAddress
NBC MESHTEC INCJAPAN'S TOKYO TOYOTA HINO 2 CHOME SOME 50 TO 3 TOKYO TOKYO METROPOLIS

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Motojima, Nobukazu Yamanashi , JP 10 32
Nakayama, Tsuruo Saitama , JP 23 112
Yokomizo, Toru Tokyo , JP 3 19

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