High density cobalt-manganese coprecipitated nickel hydroxide and process for its production

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United States of America Patent

PATENT NO 7585435
APP PUB NO 20060081818A1
SERIAL NO

11243820

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Abstract

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The present invention provides high density cobalt-manganese coprecipitated nickel hydroxide, particularly having a tapping density of 1.5 g/cc or greater, and a process for its production characterized by continuous supply of an aqueous solution of a nickel salt which contains a cobalt salt and a manganese salt, of a complexing agent and of an alkali metal hydroxide, into a reactor either in an inert gas atmosphere or in the presence of a reducing agent, continuous crystal growth and continuous removal.

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Patent Owner(s)

Patent OwnerAddress
TANAKA CHEMICAL CORPORATON5-10 AZA SUNAHAMAWARI 45 SHIRAKATA-CHO FUKUI-SHI FUKUI-KEN

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Iida, Toyoshi Fukui , JP 10 146
Ito, Hiroyuki Fukui , JP 540 5295
Shimakawa, Mamoru Fukui , JP 5 99
Usui, Takeshi Fukui , JP 20 380

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