Method and system for logic design for cell projection particle beam lithography
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United States of America Patent
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Aug 25, 2009
Grant Date -
Jun 5, 2008
app pub date -
Dec 1, 2006
filing date -
Dec 1, 2006
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Abstract
A method for particle beam lithography, such as electron beam (EB) lithography, includes predefining a stencil design having a plurality of cell patterns with information from a cell library, fabricating the stencil design, synthesizing a functional description into a logic circuit design after predefining the stencil design so that one or more characteristics of the stencil design are considered during synthesizing of the functional description into the logic circuit design, optimizing the logic circuit design, generating a layout design from the optimized logic circuit design, and forming the logic circuit on a substrate according to the stencil design and the layout design.
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