Method for focusing patterning nano-sized structure
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United States of America Patent
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Aug 25, 2009
Grant Date -
Oct 12, 2006
app pub date -
Feb 1, 2006
filing date -
Apr 12, 2005
priority date (Note) -
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Abstract
A nano-structure can be focus-patterned while minimizing the generation of a noise pattern by the inventive method which comprises the steps of: (i) mounting a plate having a nano-scale pattern formed thereon by a patterned photoresist layer on an electrode placed in an externally grounded reactor and applying a voltage to the electrode; (ii) accumulating charges selectively onto the photoresist layer on the plate mounted on the electrode; and (iii) introducing charged nanoparticle aerosol into the reactor and guiding the migration of the charged nanoparticles to the uncharged nano-scale pattern region on the plate mounted on the electrode to guide the nanoparticles to adhere to the center region of the pattern.
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