Method and apparatus for optically controlling the quality of objects having a circular edge
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United States of America Patent
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Aug 18, 2009
Grant Date -
Apr 6, 2006
app pub date -
Nov 16, 2005
filing date -
May 19, 2003
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Abstract
Method and apparatus for optically testing the quality of objects such as silicon wafers which have a circular peripheral edge, wherein light is directed onto the edge region of the object, and the light radiating from the object due to reflection, refraction and/or diffraction is detected by means of a measuring unit which produces an image from the received light. Defects on and/or in the object are identified from the produced image.
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