Microlithographic projection exposure apparatus
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United States of America Patent
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Aug 4, 2009
Grant Date -
Aug 24, 2006
app pub date -
Nov 23, 2005
filing date -
May 30, 2003
priority date (Note) -
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Abstract
A microlithographic projection exposure apparatus contains an illumination system for generating projection light and a projection lens with which a reticle that is capable of being arranged in an object plane of the projection lens can be imaged onto a light-sensitive layer that is capable of being arranged in an image plane of the projection lens. The projection lens is designed for immersion mode, in which a final lens element of the projection lens on the image side is immersed in an immersion liquid. A terminating element that is transparent in respect of the projection is fastened between the final lens element on the image side and the light-sensitive layer.
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