Electrochemical etching
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United States of America Patent
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Aug 4, 2009
Grant Date -
Sep 21, 2006
app pub date -
Mar 15, 2005
filing date -
Mar 15, 2005
priority date (Note) -
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Abstract
Methods to etch a workpiece are described. In one embodiment, a workpiece is disposed within an etchant solution having a composition comprising a dilute acid and a non-ionic surfactant. An electric field is generated within the etchant solution to cause an anisotropic etch pattern to form on a surface of the workpiece.
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