Gas flux system chamber design and positioning method
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United States of America Patent
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Aug 4, 2009
Grant Date -
Jun 28, 2007
app pub date -
Dec 11, 2006
filing date -
Sep 1, 2005
priority date (Note) -
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Abstract
A gas flux chamber assembly is provided that includes a lift-and-rotate mechanism and a chamber. The chamber is moved between first and second positions, wherein the chamber is positioned over a sample in the first position and is positioned outside of an area above the sample in the second position. In operation, the chamber is first lifted off of the collar and is then rotated, about a rotational axis outside of the area above the collar. These acts are reversed to move the chamber from the second position to the first position.
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