Correction lens system for a particle beam projection device

United States of America Patent

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Jul 14, 2009
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Sep 20, 2007
app pub date
Feb 24, 2005
filing date
Apr 23, 2004

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Abstract

A correction lens system for a particle beam projection device with at least a first magnetic lens and a second magnetic lens is disclosed. A plurality of correction lens pairs is arranged between the first magnetic lens and second magnetic lens and the particle beam.

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VISTEC ELECTRON BEAM GMBH	07743 JENA

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Inventor Name	Address	# of filed Patents	Total Citations
Doering, Hans-Joachim	Jena , DE	6	215
Elster, Thomas	Jena , DE	6	65

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Correction lens system for a particle beam projection device

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United States of America Patent

11587234

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PATENT NO	7560713
APP PUB NO	20070215812A1
SERIAL NO	11587234
DOCKET NO

US Family Size	Non-US Coverage
Patent Longevity	Forward Citations

DATE PUBLISHED	PUBLICATION/PATENT NO.	PUBLICATION TYPE
July 14, 2009	US,7560713,B2 US7560713B2	GRANTED PATENT AS SECOND PUBLICATION
September 20, 2007	US,20070215812,A1 US20070215812A1	FIRST PUBLISHED PATENT APPLICATION

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11587234

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