Apparatus and method for supplying chemicals
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United States of America Patent
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Jul 7, 2009
Grant Date -
Jun 21, 2007
app pub date -
Feb 9, 2007
filing date -
Aug 21, 1997
priority date (Note) -
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Abstract
A chemical supplying apparatus includes first and second mixing tanks for mixing and supplying chemical slurries used in a semiconductor fabrication process. The slurries are alternately provided from the first and second mixing tanks such that the slurry is continuously available to a processing apparatus for maximum efficiency. While one of the tanks is supplying the slurry, the other tank is cleaned and then used to prepare a new batch of the slurry.
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