Plasma spectroscopy system with a gas supply
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United States of America Patent
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Jun 30, 2009
Grant Date -
Mar 5, 2009
app pub date -
Mar 31, 2006
filing date -
Mar 31, 2005
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Abstract
A spectroscopy system for spectro-chemical analysis of a sample includes a plasma torch (50) for generating a microwave induced plasma (90) as a spectroscopic source. The plasma forming gas is nitrogen which can contain an oxygen impurity. Thus the system includes a nitrogen generator (70) which is preferably supplied with compressed atmospheric air from a compressor (75) for oxygen to be removed from the air by adsorption. The invention allows the use of an on-site nitrogen gas generator and thus gives cost savings because the need to obtain supplies of bottled high purity gas is eliminated.
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