Robot calibration system and method
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United States of America Patent
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Jun 23, 2009
Grant Date -
Jun 28, 2007
app pub date -
Nov 17, 2006
filing date -
Nov 18, 2005
priority date (Note) -
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Abstract
A robot calibration system and method for robots in semiconductor wafer processing systems is disclosed. The calibration system comprises a calibration array, a dummy wafer and a control system programmed with a calibration routine. The calibration array has an plurality of inductive proximity sensors to determine parallelism of the robot relative to a station and a center locating sensor to determine the center of the station.
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