Charged beam dump and particle attractor
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United States of America Patent
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Jun 16, 2009
Grant Date -
Dec 21, 2006
app pub date -
Jun 2, 2006
filing date -
Jun 3, 2005
priority date (Note) -
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Abstract
A system, method, and apparatus for mitigating contamination during ion implantation are provided. An ion source, end station, and mass analyzer positioned between the ion source and the end station are provided, wherein an ion beam is formed from the ion source and travels through the mass analyzer to the end station. An ion beam dump assembly comprising a particle collector, particle attractor, and shield are associated with the mass analyzer, wherein an electrical potential of the particle attractor is operable to attract and constrain contamination particles within the particle collector, and wherein the shield is operable to shield the electrical potential of the particle attractor from an electrical potential of an ion beam within the mass analyzer.
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