Ground strap for suppressing stiction during MEMS fabrication

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United States of America Patent

PATENT NO 7544531
SERIAL NO

11770509

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Abstract

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To suppress stiction of a MEMS resonator during fabrication, conductive structures of the MEMS resonator are electrically coupled via a ground strap during the step of forming isolation trenches around their contact structures. After the isolation trenches have been formed, the ground strap is transformed into a non-conductive material to complete the electrical isolation of the conductive structures. An etch mask formed on top of the ground strap prevents etching of the ground strap during the formation of the trenches. Depending on the etching process, the ground strap may be formed as a bridge that suspends above the isolation trench or as a column that extends down to the bottom of the isolation trench.

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Patent Owner(s)

Patent OwnerAddress
SITIME CORPORATION5451 PATRICK HENRY DRIVE SANTA CLARA CA 95054

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Grosjean, Charles San Jose, US 15 478

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