Polymer, resist composition, and patterning process
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United States of America Patent
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May 26, 2009
Grant Date -
May 22, 2008
app pub date -
Oct 3, 2007
filing date -
Oct 4, 2006
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Abstract
To a resist composition, an alkali-soluble polymer having fluorinated ester-containing lactone units incorporated therein is included as an additive. The resist composition forms a resist film having a reduced contact angle after development. The resist film prevents water penetration during immersion lithography.
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