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• 15 United States
• 10 France
• 8 Japan
• 7 China
• 5 Korea
• 2 Other

Patent Owner(s)

Patent Owner	Address
TOYO GOSEI CO LTD	1603 KAMIMYODEN ICHIKAWA-SHI CHIBA 2720012

International Classification(s)

• C08G:MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN B....

• [Classification Symbol]

• [Patents Count]

Inventor(s)

Inventor Name	Address	# of filed Patents	Total Citations
Obara, Satoru	c/o Photosensitive Materials Research Center, Toyo Gosei Co., Ltd., 2-1, Wakahagi 4-chome, Inbu-mura	3	33
Tada, Kentaro	c/o Photosensitive Materials Research Center, Toyo Gosei Co., Ltd., 2-1, Wakahagi 4-chome, Inba-mura	14	75

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Maintenance Fees

Fee	Large entity fee	small entity fee	micro entity fee	due date

Fee	Large entity fee	small entity fee	micro entity fee
Surcharge after expiration - Late payment is unavoidable	$700.00	$350.00	$175.00
Surcharge after expiration - Late payment is unintentional	$1,640.00	$820.00	$410.00

DATE PUBLISHED	PUBLICATION/PATENT NO.	PUBLICATION TYPE
May 12, 2009	US,7531619,B2   US7531619B2	GRANTED PATENT AS SECOND PUBLICATION
June 08, 2006	US,20060122364,A1   US20060122364A1	FIRST PUBLISHED PATENT APPLICATION

Full Text

US Patent No: 7531619

Process for producing dendrimer, building block compound, and process for producing thiophene compound

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