Magnet arrangement for a planar magnetron
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United States of America Patent
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May 12, 2009
Grant Date -
Oct 5, 2006
app pub date -
Mar 20, 2006
filing date -
Apr 5, 2005
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A magnetic arrangement for a planar magnetron, in which an initial magnetic pole encompasses a second magnetic pole. This magnetic arrangement is moved linear in longitudinal direction to a target by a specific value and then moved back in opposite direction by the same value. In one version, an additional perpendicular motion is effected. The magnet arrangement is designed so that north and south pole interlock and waviform racetracks are generated. This enables constant sputtering from the entire target surface.
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