Reticle and optical proximity correction method
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United States of America Patent
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May 5, 2009
Grant Date -
May 10, 2007
app pub date -
Nov 10, 2005
filing date -
Nov 10, 2005
priority date (Note) -
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Abstract
An OPC method includes providing a primary mask having a primary pattern, forming an assist mask having a correction pattern substantially complementary to the primary pattern, and forming a reticle by overlapping the primary mask and the assist mask. The light transmittance of the correction pattern is adjustable so as to equalize the light intensity distribution of the primary mask.
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