Applications of semiconductor nano-sized particles for photolithography
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United States of America Patent
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Apr 28, 2009
Grant Date -
Mar 26, 2009
app pub date -
Mar 4, 2004
filing date -
Mar 4, 2003
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Abstract
Semiconductor nano-sized particles possess unique optical properties, which make them ideal candidates for various applications in the UV photolithography. In this patent several such applications, including using semiconductor nano-sized particles or semiconductor nano-sized particle containing materials as highly refractive medium in immersion lithography, as anti-reflection coating in optics, as pellicle in lithography and as sensitizer in UV photoresists are described.
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