Material for the treatment of lithographic substrates and lithographic printing plates
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United States of America Patent
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Apr 28, 2009
Grant Date -
Aug 28, 2008
app pub date -
Jan 12, 2006
filing date -
Jan 20, 2005
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Expired
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Abstract
Phosphono-substituted siloxanes suitable as interlayer material in lithographic substrates and for post-treating developed lithographic printing plates, obtainable by reacting (a) a first organosilicon compound of the general formula (I) and (b) a second organosilicon compound of the general formula (II).
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