Hydrophilicity treatment method of a silicon wafer
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United States of America Patent
Stats
-
Apr 7, 2009
Grant Date -
Sep 6, 2007
app pub date -
Feb 23, 2007
filing date -
Mar 3, 2006
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
In a hydrophilicity treatment method including the step of rotating, on a polishing cloth, a mirror surface of a silicon wafer subjected to mirror-polishing followed by rinsing treatment while the mirror surface is pushed onto the cloth under the application of a small load with the contact of the mirror surface with a hydrophilicity treatment liquid, thereby making the mirror surface hydrophilic, the hydrophilicity treatment liquid is an aqueous liquid which comprises an organic compound having at least one hydrophilic group and having a molecular weight of 100 or more, a basic nitrogen-containing organic compound and a surfactant, and which has a pH of 9.5 to 10.5.
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