8-mirror microlithography projection objective
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United States of America Patent
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Mar 24, 2009
Grant Date -
Jun 12, 2008
app pub date -
Feb 6, 2008
filing date -
Oct 20, 2000
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Abstract
A projection objective provides a light path for a light bundle from an object field in an object plane to an image field in an image plane. The projection objective includes a first mirror (S1), a second mirror (S2), a third mirror (S3), a fourth mirror (S4), a fifth mirror (S5), a sixth mirror (S6), a seventh mirror (S7), and an eighth mirror (S8). The light bundles includes light with a wavelength in a range of 10-30 nm. The light is provided via the eight mirrors, and in the light path exactly one intermediate image of the object field is provided.
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