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• 15 United States
• 10 France
• 8 Japan
• 7 China
• 5 Korea
• 2 Other

Patent Owner(s)

Patent Owner	Address
DUPONT ELECTRONICS INC	974 CENTRE ROAD WILMINGTON DE 19805

International Classification(s)

• B41N:PRINTING PLATES OR FOILS
• B41C:PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF P....
• G03F:PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNE....

• 2005 Application Filing Year
• B41N Class
• 43 Applications Filed
• 13 Patents Issued To-Date
• 30.24 % Issued To-Date

Inventor(s)

Inventor Name	Address	# of filed Patents	Total Citations
Dudek, Dietmar	Langen, DE	19	231
# of filed Patents : 19 Total Citations : 231
Hackler, Mark A	Ocean, US	22	187
# of filed Patents : 22 Total Citations : 187
Kannurpatti, Anandkumar R	E. Windsor, US	15	142
# of filed Patents : 15 Total Citations : 142
McMillen, Robert A	Downingtown, US	16	81
# of filed Patents : 16 Total Citations : 81
Trainor,, Jr John W	Vestal, US	1	3
# of filed Patents : 1 Total Citations : 3

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Patent Citation Ranking

• 3 Citation Count
• B41N Class

• 0 % this patent is cited more than
• 16 Age

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Maintenance Fees

Fee	Large entity fee	small entity fee	micro entity fee	due date

Fee	Large entity fee	small entity fee	micro entity fee
Surcharge after expiration - Late payment is unavoidable	$700.00	$350.00	$175.00
Surcharge after expiration - Late payment is unintentional	$1,640.00	$820.00	$410.00

DATE PUBLISHED	PUBLICATION/PATENT NO.	PUBLICATION TYPE
March 17, 2009	US,7503258,B2   US7503258B2	GRANTED PATENT AS SECOND PUBLICATION
February 09, 2006	US,20060029880,A1   US20060029880A1	FIRST PUBLISHED PATENT APPLICATION

Full Text

US Patent No: 7503258

Method and apparatus for thermal development with development medium remover

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Abstract

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This invention relates to a method and apparatus for thermally developing a photosensitive element. The thermal development method includes heating the photosensitive element to a temperature sufficient to cause a portion of a composition layer in the element to liquefy, soften, or melt, contacting the heated photosensitive element with a development medium to absorb the liquefied portion at a contact location, and removing the development medium from the photosensitive element with a remover at a location away from the contact location.

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Description

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Claims

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Legal Events

 

• MAFP2020
• AS2019
• FPAY2016
• FPAY2012
• I2009
• STCF2009
• P2006
• AS2005
• F2005
• PD2004

Date	Code	Event	Description
Sep 03, 2020	MAFP	MAINTENANCE FEE PAYMENT	free format text: PAYMENT OF MAINTENANCE FEE, 12TH YEAR, LARGE ENTITY (ORIGINAL EVENT CODE: M1553); ENTITY STATUS OF PATENT OWNER: LARGE ENTITY year of fee payment: 12
Jun 17, 2019	AS	ASSIGNMENT	free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNOR:E. I. DU PONT DE NEMOURS AND COMPANY;REEL/FRAME:049583/0269 Owner name: DUPONT ELECTRONICS, INC., DELAWARE Effective Date: Jun 17, 2019
Sep 01, 2016	FPAY	FEE PAYMENT	year of fee payment: 8
Aug 22, 2012	FPAY	FEE PAYMENT	year of fee payment: 4
Mar 17, 2009	I	Issuance
Feb 25, 2009	STCF	INFORMATION ON STATUS: PATENT GRANT	free format text: PATENTED CASE
Feb 09, 2006	P	Published
Sep 28, 2005	AS	ASSIGNMENT	free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNORS:MCMILLEN, ROBERT A.;KANNURPATTI, ANANDKUMAR R.;HACKLER, MARK A.;AND OTHERS;REEL/FRAME:016596/0035;SIGNING DATES FROM 20050809 TO 20050913 Owner name: E. I. DU PONT DE NEMOURS AND COMPANY, DELAWARE
Jul 28, 2005	F	Filing
Aug 03, 2004	PD	Priority Date