System for monitoring foreign particles, process processing apparatus and method of electronic commerce

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United States of America Patent

PATENT NO 7499157
APP PUB NO 20070165212A1
SERIAL NO

11727037

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Abstract

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A system for monitoring foreign matter includes a manufacturing line having plural process processing apparatuses, a production management system which manages the processing of workpieces in the manufacturing line, plural optical heads which monitor foreign matter in relation to at least one of the workpieces, and which provide an output signal indicative thereof, and at least one image signal processing unit provided in a lesser number than a number of the plural optical heads for processing the output signal therefrom.

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Patent Owner(s)

Patent OwnerAddress
HITACHI ELECTRONICS ENGINEERING CO LTDSHIBUYA-KU TOKYO 150

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Nishiyama, Hidetoshi Fujisawa , JP 131 2044
Noguchi, Minori Mitsukaido, JP 124 2649
Sekiguchi, Takuaki Honjo, JP 7 57
Watanabe, Tetsuya Honjo , JP 269 2141

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