Method and system for detection of wafer centering in a track lithography tool
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Mar 3, 2009
Grant Date -
Jul 17, 2008
app pub date -
Jun 14, 2007
filing date -
Jan 11, 2007
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
A system for measuring substrate concentricity includes a substrate support member adapted to rotate a substrate around a substantially vertical axis. The substrate includes a mounting surface and a process surface. The system also includes a spin cup positioned below the substrate and a translatable arm mounted a predetermined distance above the process surface of the substrate. The translatable arm is adapted to translate along a radius of the substrate. The system further includes an optical emitter mounted on the translatable arm and an optical detector mounted on the translatable arm.
First Claim
Family
International Classification(s)
- [Classification Symbol]
- [Patents Count]
Cited Art Landscape
Patent Citation Ranking
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully