Electrostatic deflection system for corpuscular radiation

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United States of America Patent

PATENT NO 7491946
APP PUB NO 20060192133A1
SERIAL NO

11346666

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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The invention is directed to electrostatic deflection systems for corpuscular beams which can be used particularly in microstructured and nanostructured applications in lithography installations or measuring equipment. According to the proposed object of the invention, the individual electrodes of a deflection system of this kind should permanently have and retain a very exact axially symmetric arrangement relative to one another. In the electrostatic deflection system according to the invention, rod-shaped electrodes are held in an axially symmetric arrangement in an inwardly hollow carrier through which a corpuscular beam can be directed. The carrier is formed of at least two, and at most four, carrier members which are connected to one another.

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First Claim

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Patent Owner(s)

Patent OwnerAddress
VISTEC ELECTRON BEAM GMBH07743 JENA

International Classification(s)

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Damm, Christoph Jena , DE 38 5185
Doering, Hans-Joachim Jena , DE 6 215
Elster, Thomas Jena , DE 6 65
Gebhardt, Andreas Apolda , DE 11 33
Peschel, Thomas Jena , DE 21 2451
Risse, Stefan Jena , DE 16 1022
Rohde, Mathias Jena , DE 2 5
Schenk, Christoph Jena , DE 14 57
Schubert, Gerhard Jena , DE 21 101

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