Method of forming conductive pattern, thin film transistor, and method of manufacturing the same

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United States of America Patent

PATENT NO 7485576
APP PUB NO 20060145146A1
SERIAL NO

11296874

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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A method of forming a conductive pattern in which the conductive pattern can be easily formed at a low temperature without a photolithography process by forming the conductive pattern using a laser ablation method and an inkjet method, an organic thin film transistor manufactured using the method, and a method of manufacturing the organic thin film transistor. The method of forming a conductive pattern in a flat panel display device includes preparing a base member, forming a groove having the same shape as the conductive pattern in the base member, and forming the conductive pattern by applying a conductive material into the groove. The base member has one of a structure including a plastic substrate having the groove and a structure including a substrate and an insulating layer which is arranged on the substrate and which has the groove.

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Patent Owner(s)

  • SAMSUNG DISPLAY CO., LTD.;SAMSUNG SDI GERMANY GMBH

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Ahn, Taek Suwon-si , KR 31 392
Humbs, Werner Berlin , DE 8 113
Joerg, Fischer Berlin , DE 2 27
Kim, Hye-Dong Suwon-si , KR 38 396
Koo, Jae-Bon Suwon-si , KR 122 1072
Suh, Min-Chul Suwon-si , KR 124 1337

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