Photoresist composition
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United States of America Patent
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Jan 27, 2009
Grant Date -
Oct 12, 2006
app pub date -
Mar 23, 2006
filing date -
Aug 28, 1997
priority date (Note) -
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Abstract
Photoresist compositions having a resin binder with an acid labile blocking group with an activation energy in excess of 20 Kcal/mol. for deblocking, a photoacid generator capable of generating a halogenated sulfonic acid upon photolysis and optionally, a base.
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