Extreme ultraviolet source with wide angle vapor containment and reflux
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United States of America Patent
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Jan 20, 2009
Grant Date -
Jul 12, 2007
app pub date -
Dec 11, 2006
filing date -
Dec 9, 2005
priority date (Note) -
Expired
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Abstract
An extreme ultraviolet source with wide-angle vapor containment and reflux is described. In the optical output directions radiating from the source plasma there is an array of tapered buffer gas heat pipes, with wick structures in the walls. In directions toward the insulators separating the discharge electrodes there are disc-shaped buffered gas heat pipes that prevent metal vapor from condensing on these insulators. A preferred electrode configuration has three electrode discs that operate in the star pinch mode. Another electrode configuration comprises two electrode discs and supports a pseudospark discharge. The star pinch variant of this source has efficiently generated 13.5 nm radiation with lithium vapor and helium buffer gas.
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