EUV light source optical elements
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United States of America Patent
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Jan 13, 2009
Grant Date -
Jul 26, 2007
app pub date -
Mar 19, 2007
filing date -
Mar 10, 2004
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Abstract
Apparatus and methods are disclosed for forming plasma generated EUV light source optical elements, e.g., reflectors comprising MLM stacks employing various binary layer materials and capping layer(s) including single and binary capping layers for utilization in plasma generated EUV light source chambers, particularly where the plasma source material is reactive with one or more of the MLM materials.
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