Mask making method, mask making device, and mask drawing device
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United States of America Patent
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-
Jan 6, 2009
Grant Date -
Jun 22, 2006
app pub date -
Jan 28, 2004
filing date -
Jan 28, 2003
priority date (Note) -
Expired
status (Latency Note)
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Abstract
, a time required for lithography the entire mask pattern is extremely shortened as compared with a conventional one. As a result, the mask cost can be largely reduced.
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