Nanometrology device standards for scanning probe microscopes and processes for their fabrication and use
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United States of America Patent
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Jan 6, 2009
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N/A
app pub date -
Nov 17, 2005
filing date -
Nov 17, 2004
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Abstract
Nanometrology device standards and methods for fabricating and using such devices in conjunction with scanning probe microscopes are described. The fabrication methods comprise: (1) epitaxial growth that produces nanometer sized islands of known morphology, structural, morphological and chemical stability in typical nanometrology environments, and large height-to-width nano-island aspect ratios, and (2) marking suitable crystallographic directions on the device for alignment with a scanning direction.
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