Hollow cathode target and methods of making same
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United States of America Patent
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Dec 23, 2008
Grant Date -
Aug 4, 2005
app pub date -
Mar 28, 2005
filing date -
Nov 27, 2000
priority date (Note) -
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Abstract
Sputtering targets and methods of making sputtering targets are described. The method includes the steps of: providing a sputtering metal workpiece made of a valve metal; transverse cold-rolling the sputtering metal workpiece to obtain a rolled workpiece; and cold-working the rolled workpiece to obtain a shaped workpiece. The sputtering targets exhibits a substantially consistent grain structure and/or texture on at least the sidewalls.
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