Layer forming method, product comprising the layer, optical film, dielectric-coated electrode and plasma discharge apparatus
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United States of America Patent
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Dec 9, 2008
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N/A
app pub date -
Mar 25, 2005
filing date -
Dec 12, 2000
priority date (Note) -
Expired
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Abstract
A layer forming method is disclosed which comprises the steps of supplying power of not less than 1 W/cm.sup.2 at a high frequency voltage exceeding 100 kHz across a gap between a first electrode and a second electrode opposed to each other at atmospheric pressure or at approximately atmospheric pressure to induce a discharge, generating a reactive gas in a plasma state by the charge, and exposing a substrate to the reactive gas in a plasma state to form a layer on the substrate.
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