Method and apparatus for forming a coating
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United States of America Patent
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Nov 25, 2008
Grant Date -
Feb 5, 2004
app pub date -
Sep 25, 2001
filing date -
Oct 4, 2000
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A method for forming a coating on a substrate using an atmospheric pressure plasma discharge. The method comprises introducing an atomized liquid and/or solid coating-forming material into an atmospheric pressure plasma discharge and/or an ionized gas stream resulting therefrom, and exposing the substrate to the atomized coating-forming material. The application also described a method for polymerizing a polymer forming material, and further to apparatus for forming a coating on a substrate.
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