Illumination system particularly for microlithography
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United States of America Patent
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Oct 28, 2008
Grant Date -
Nov 2, 2006
app pub date -
Feb 2, 2006
filing date -
May 5, 1998
priority date (Note) -
Expired
status (Latency Note)
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Abstract
There is provided an illumination system. the illumination system includes (a) a source of light having a wavelength of less than or equal to 193 nm, and (b) an optical element in a path of the light, having a first raster element, a second raster element, a third raster element and a fourth raster element situated thereon. The second raster element is adjacent to the first raster element, and located a first distance from the first raster element. The fourth raster element is adjacent to the third raster element, and located a second distance from the third raster element. The second distance is different from the first distance.
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