Photocatalyst and process for purifying gas effluent by photocatalytic oxidation
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United States of America Patent
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Oct 14, 2008
Grant Date -
Jan 19, 2006
app pub date -
Oct 28, 2002
filing date -
Oct 29, 2001
priority date (Note) -
Expired
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Abstract
The photocatalyst based on a composite WO.sub.3--SiC/TiO.sub.2 semiconductor and subjected to radiation whose wavelength is at least partly less than 400 nm gives1 photocatalytic oxidation of volatile organic compounds and leads to their total mineralisation into CO.sub.2 and H.sub.2O.The process for the photocatalytic purification of industrial, agricultural or domestic gaseous effluent may be conducted at room pressure and temperature. Its conversion rate is high and stable.
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