Method of manufacturing suspension structure
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United States of America Patent
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Oct 7, 2008
Grant Date -
Dec 27, 2007
app pub date -
Aug 1, 2006
filing date -
Jun 21, 2006
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A method of manufacturing a suspension structure including providing a substrate, forming a first photoresist pattern on the substrate, heating the first photoresist pattern to harden it as a sacrificial layer, forming a second photoresist pattern on the substrate and the sacrificial layer, the second photoresist pattern exposing a part of the substrate and the sacrificial layer, forming a structure layer on the substrate, the second photoresist pattern, and the sacrificial layer, performing a lift off process to remove the second photoresist pattern and the structure layer above the second photoresist pattern, and performing a dry etching process to remove the sacrificial layer in order to make the structure layer become the suspension structure.
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