Sputter target based on titanium dioxide
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United States of America Patent
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Oct 7, 2008
Grant Date -
Feb 27, 2003
app pub date -
Aug 19, 2002
filing date -
Aug 17, 2001
priority date (Note) -
Expired
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Abstract
An electrically conductive titanium dioxide sputter target with an electrical resistivity of less than 5 .OMEGA.-cm, which contains as an additive at least one doping agent or a mixture of doping agents in an amount of less than 5 mole %. The doping agent or agents are selected from the group including indium oxide, zinc oxide, bismuth oxide, aluminum oxide, gallium oxide, antimony oxide, and zirconium oxide. This treatment renders the titanium dioxide sputter target suitable for use in a direct-current sputtering process without any negative effects on the properties of the coating.
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