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Abstract

A single-gate non-volatile memory and an operation method thereof, wherein a transistor and a capacitor structure are embedded in a semiconductor substrate; the transistor comprises: a first electrically-conductive gate, a first dielectric layer, and multiple ion-doped regions; the capacitor structure comprises: a second electrically-conductive gate, a second dielectric layer, and a second on-doped region; the first electrically-conductive gate and the second electrically-conductive gate are interconnected to form a single floating gate of a memory cell; a reverse bias is used to implement the reading, writing, and erasing operations of the single-floating-gate memory cell; in the operation of a single-gate non-volatile memory with an isolation well, positive and negative voltages are applied to the drain, the gate, and the silicon substrate/the isolation well to create an inversion layer so that the absolute voltage, the area of the voltage booster circuit, and the current consumption can be reduced.

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First Claim