Irradiation system with ion beam/charged particle beam
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United States of America Patent
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Sep 9, 2008
Grant Date -
Jun 1, 2006
app pub date -
Aug 12, 2005
filing date -
Nov 30, 2004
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Abstract
In an irradiation system with an ion beam/charged particle beam, an ion beam/charged particle beam is deflected by an energy filter for the energy analysis and then a wafer irradiated with the beam. The energy filter controls the spread of magnetic field distribution caused by a deflection magnet, cancels a leakage magnetic field in the longitudinal direction, and bends the ion beam/charged particle beam at a uniform angle at any positions overall in scanning-deflection area.
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