Photosensitive resin compositions
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United States of America Patent
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Aug 26, 2008
Grant Date -
Aug 18, 2005
app pub date -
Feb 18, 2005
filing date -
Oct 15, 2003
priority date (Note) -
Expired
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Abstract
A positive-working photosensitive composition comprising one or more polybenzoxazole precursor polymers, a diazonaphthoquinone photoactive compound which is the condensation product of a compound containing from 2 to about 9 aromatic hydroxyl groups with a 5-naphthoquinone diazide sulfonyl compound and a 4-naphthoquinone diazide sulfonyl compound, and at least one solvent, and the use of such compositions to form a relief pattern on a substrate thereby forming a coated substrate.
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